Dynamic grating formation in As/sub 2/S/sub 3/

Summary form only given. This work focuses on using the photoexpansion effect to fabricate surface-grating structures and studying their applicability in photonic circuitry. Surface gratings with periods ranging from 2.95 /spl mu/m to 0.377 /spl mu/m were written holographically using 514.5-nm light from an argon ion laser. Gratings with 2.95 /spl mu/m period were also written for different exposure times to study the dose effect on surface-relief structures. Atomic force microscope (AFM) images of the irradiated surfaces were obtained. A He-Ne laser operating at 632.8 nm was used to measure diffraction efficiencies.