Abstract:
This work reports the successful fabrication of an all-oxide heteroepitaxial structure with a bilayer tunnel junction consisting of ferroelectric and ferrimagnetic layers...Show MoreMetadata
Abstract:
This work reports the successful fabrication of an all-oxide heteroepitaxial structure with a bilayer tunnel junction consisting of ferroelectric and ferrimagnetic layers. Each layer of the structure exhibits high crystallinity and well-defined interfaces. The transport properties of the junction are found to be well described by the characteristics of an asymmetric ferroelectric tunnel junction.
Date of Conference: 23-26 July 2018
Date Added to IEEE Xplore: 27 January 2019
ISBN Information:
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