Abstract:
We successfully fabricated submicron depletion-mode GaAs MOSFETs with negligible hysteresis and drift in drain current using Ga2O3(Gd2O3) as the gate oxide. The 0.8-μm ga...Show MoreMetadata
Abstract:
We successfully fabricated submicron depletion-mode GaAs MOSFETs with negligible hysteresis and drift in drain current using Ga2O3(Gd2O3) as the gate oxide. The 0.8-μm gate-length device shows a maximum drain current density of 450 mA/mm and a peak extrinsic transconductance of 130 mS/mm. A short-circuit current gain cutoff frequency (fT) of 17 GHz and a maximum oscillation frequency (fmax) of 60 GHz were obtained from the 0.8 μm×60 μm device. The absence of drain current drift and hysteresis along with excellent characteristics in the submicron devices is a significant advance toward the manufacture of commercially useful GaAs MOSFETs.
Published in: IEEE Electron Device Letters ( Volume: 20, Issue: 9, September 1999)
DOI: 10.1109/55.784451