Enhancement Of Ionization In Ionized PVD By RF Pulsing And Magnetic Field

Ionized PVD has been developed for trench filling narrower than I μm replacing currently using collimated PVD.[1],[2] I-PVD is using post-ionization of sputtered metals by secondary high density plasma source like ICP in this study. The working gas, Ar, forms high density plasma by ICP but heavily sputtered metal atoms having lower ionization threshold easily quench the Ar plasma and limits ion density toward substrate.[3] !So we tried two different approaches to overcome this problem.