A novel unified transient enhanced diffusion model on the basis of RSF with process database

A novel unified TED (transient enhanced diffusion) model for RTA and furnace processes is proposed on the basis of the vacancy-assisted diffusion model. The effective diffusivity is described by a RSF (response surface function) based on relaxation-time approximation of point defects, which depends on the annealing temperature and implant dose. The parameters were calibrated with a database set of experimental test structures. The ramp-up effect is taken into account with a new damage relaxation budget equation. In particular, the BF/sub 2/ implant-induced damage was demonstrated. It results in an excellent experimental agreement within /spl Delta/xj<0.01 /spl mu/m for xj=0.08-0.15 /spl mu/m N/P junction formations.