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Test structures to characterise a novel circuit fabrication technique that uses offset lithography | IEEE Conference Publication | IEEE Xplore

Test structures to characterise a novel circuit fabrication technique that uses offset lithography


Abstract:

This paper reports on the use of microelectronic test structures to characterise a novel fabrication technique for thin-film electronic circuit boards. In this technology...Show More

Abstract:

This paper reports on the use of microelectronic test structures to characterise a novel fabrication technique for thin-film electronic circuit boards. In this technology, circuit tracks are formed on paper-like substrates by depositing films of a metal-loaded ink via a standard lithographic printing process. Sheet resistance and line width are electrically evaluated and these quantities are compared with optical and surface profiling measurements.
Date of Conference: 23-26 March 1998
Date Added to IEEE Xplore: 06 August 2002
Print ISBN:0-7803-4348-4
Conference Location: Kanazawa, Japan

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