Submicron lines in thin metal films micromachined by an ultrafast laser oscillator

Summary form only given. We demonstrate submicron micromachining with an ultrafast laser oscillator for the first time. The laser used was a 100-fs Ti:sapphire laser with an output power of 0.35 W operating at 89 MHz. A Faraday isolator was used to reject any backreflection from the work piece. A wave plate and polarizer combination was used to vary the laser power incident on target.