Non-destructive method of shear stress test by new test structure | IEEE Conference Publication | IEEE Xplore

Non-destructive method of shear stress test by new test structure


Abstract:

A new test structure was developed for a nondestructive method. The purpose of this test structure is to detect the influence of thermomechanical stress between silicon c...Show More

Abstract:

A new test structure was developed for a nondestructive method. The purpose of this test structure is to detect the influence of thermomechanical stress between silicon chip and plastic resin. In this structure, detection of the failure is very easy, because the influence of thermomechanical stress can be detected electrically. By using this new structure, the following results were found: (1) Dependence on chip size; (2) Influence of layout of package; (3) Acceleration between heat shock and temperature cycle tests.
Date of Conference: 22-25 March 1995
Date Added to IEEE Xplore: 06 August 2002
Print ISBN:0-7803-2065-4
Conference Location: Nara, Japan

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