Smart IR Drop Reduction technique using Pegasus flow

With advancement in technology, the challenges in terms of power, area, and timing have increased exponentially. Shrinking technology results in more cells in smaller area causing significant increase in terms of peak current requirement. Also, IR Drop hotspots occur due to high current requirements in particular regions. Hence, it becomes very important to reduce the IR Drop as it impacts the speed of the cells as well as the overall performance of the chip. In this paper, we have proposed a Post-PNR Addition of smart power and ground Metal Fills, without impacting on the timing of a device to improve IR drop.