F/sub 2/ laser processing of silicone

We photochemically modified silicones for fabrication of SiO/sub 2/ by a 157-nm F/sub 2/ laser irradiation. Humps of SiO/sub 2/ at a height of several microns could be fabricated on silicone rubber. Micro-patterning of silicons films was also fabricated by immersing the modified films in hydrogen fluoride solution. The photochemical modifications did not take place when a 193-nm ArF laser was used.