Low-threshold lasing of optically pumped InGaN vertical-cavity surface-emitting lasers with dielectric mirrors

III-nitride VCSELs are fabricated by removing SiC substrate from the Ill-nitride cavity, and subsequent wafer bonding of the cavity and DBRs. Low-threshold lasing action in InGaN VCSELs with dielectric DBRs is observed at room temperature by optical pumping.