Damage resistant and low stress EUV multilayer mirrors

Apart from Mo/Si multilayers, we focused our interest on Mo/sub 2/C/Si multilayer mirrors. The mirrors were designed for normal incidence reflection at about 13 nm wavelength. The multilayer mirrors were deposited by dc magnetron sputtering. X-ray scattering, transmission electron microscopy, atomic force microscopy, mechanical stress measurement and chemical analysis were used for the characterization of the multilayer structures. The results are correlated to the measured normal incidence reflectivity using synchrotron radiation.