Deposition of Ti:sapphire film on quartz and sapphire substrates by laser

We studied the possibility of the deposition of crystalline Ti:sapphire films on sapphire and quartz substrates at low temperatures by ablation using a KrF excimer laser. The structural properties of the films were analysed by X-ray diffraction and electron microprobe analysis. The luminescence was measured using a double grating monochromator. The excitation was performed by an Ar/sup +/ laser at 488 nm. The waveguiding properties of the film were measured by mode spectroscopy. From propagation constants the refractive index and thickness were calculated.