Development of excimer laser and its applications at SIOFM

Summary form only given, as follows. The development of discharge pump excimer lasers with UV preionisation and X-ray preionisation is presented. For X-ray preionized discharge pump excimer laser, instead of the water transmission line as a power supply, we use a lumped low inductance capacitor bank. A specific energy as high as 9 J/liter was obtained. An excimer laser with long pulse duration is designed with pulse energy of 500 mJ at 100 Hz repetition rate. The 100 ns long pulse duration is five times longer than regular excimer laser. The applications of excimer laser include laser doping, laser annealing, laser surface treatment etc. For laser doping, p-n junction can be obtained by irradiating laser pulse on the silicon crystal with BCl/sub 3/ powder at the surface. This technique enable one step implantation and annealing processes and has been applied to fabrication of solar cells with efficiency of 11% without AR coating. For laser annealing, C/sub 60/ film was treated by excimer laser processes, the electrical conductivity of film can be increased by six orders. The products resulting from the laser irradiation have been investigated by Raman spectroscopy and the onset of conductivity is consistent with formation of amorphous carbon. For laser surface treatment, the hydrophilic character of the fluorocarbon resin was improved by excimer laser irradiation. The contact angle of the fluorocarbon with water is reduced from 110° to about 30°. Finally, the results of formation of nanometer particles by excimer laser ablation is given in detail.