Ultra thin metal films for transparent conductive layers

Optoelectronic technology often asks for conductive materials transparent to optical radiation like transparent conducting oxides (TCOs). Transparent contacts can sensibly improve efficiency and integration of optoelectronic devices, opening the possibility for new concept designs. We have investigated the feasibility to realize uniform transparent electrodes by sputtering deposition of ultra-thin metal films. In order to have an optical transmittance >60% and low resistance, metal films should be continuous with a thickness below 100A. We have studied thin film properties of a selection of metals (nickel, aluminum, titanium, chromium) deposited with a batch sputtering system customized for process manufacturing. The final goal is to define an industrial technology for the realization of transparent metal electrodes.