A Study on Deposition Rate and Thickness for ZnON Thin Films

The deposition of ZnON thin films were done using RF sputtering with Argon and Nitrogen gas. The deposited thin films were characterized using UV Vis spectroscopy and Optical profilometry. The sputtering gas pressure and other experimental parameters like RF power and time had a significant impact on the deposition rates of the thin films. The rate of deposition reduced when nitrogen was introduced from 9.34 nm/min to 2.48 nm/min. The UV vis spectroscopic results showed significant change when nitrogen was introduced predominantly with peaks at 350 nm shifting towards right. The colour of the film also is also influenced showing slight yellowish colour when nitrogen was introduced compared to a transparent Z
$n$
O thin films.