MoOx: A transparent phase change material for integrated photonics applications?

We assess the compatibility of molybdenum oxide as a transparent phase change material for integrated photonics applications. Molybdenum oxide thin film is deposited on top of a PECVD silicon nitride waveguide and propagation loss induced by the film is evaluated at a wavelength of 905 nm. The role of film stoichiometry on the overall propagation loss is reported. We also report initial results on phase shift at 905 nm that was induced post anneal. This material may be an interesting alternative to chalcogenide-based phase change materials for integrated photonics applications.