A Generation solving Layout Decomposition Method for DSA-MP Hybrid Lithography

Directed self-assembly technology with multiple patterning lithography (DSA-MP) is a promising candidate for the next-generation lithography (NGL) technique for contact/via layer fabrication. Nevertheless, a DSA-aware mask decomposer is required to implement DSA-MP technology. In this paper, we propose a method that incorporates a weighted generational solving algorithm based on graph growing and a specific backtracking strategy to solve the simultaneous template optimization and mask assignment problem. The method is a general and scalable approach that can yield a solution for a cluster of 100+ vias in less than a second.