Investigation of RS Sensitivity to Tilt Angle on 300MM High Current/Ion Implanter

In this work, the relationship of sheet resistance (RS) with tilt angle was investigated on a 300mm high current ion implanter. Angle accuracy and tool matching were firstly checked. Then the wafers were implanted with the same species/energy/dose and different tilt angles ranging from -10 degree to +40 degree. After that, all the wafers were annealed under the same process condition. Then RS was measured, and its relationship with tilt angle was studied. It was found that the sensitivity of RS to tilt angle was changed significantly in different tilt angle region. Based on the measured data, potential applications were discussed for the implantation process with different tilt angles.