Influence of defects on the femtosecond laser damage resistance of multi-layer dielectric grating

The influence of various defects on the femtosecond laser damage resistance of a HfO
2
/SiO
2
/Ta
2
O
5
-based 48-layer grating designed for 800 nm is studied using the finite-difference time-domain method incorporated with the Keldysh photoionization theory.