Comparison of Ion Energy Distribution Function on Pulse-Driven Capacitively Coupled Plasma Using a Two-Dimensional Particle-in-Cell Simulation

A pulse-driven Ar capacitively coupled plasma (CCP) has been investigated using a two-dimensional (2D) particle-in-cell (PIC) simulation parallelized with a graphics processing unit (GPU). The effect of a 400 kHz pulsed voltage added to a high-frequency sinusoidal wave was investigated on the ion energy and angle distribution (IEAD). The ion flux and the IEAD at different wafer positions were observed by varying the duty ratio, the applied voltage, and gas pressure. Moreover, an additional 2 kHz pulse-on and pulse-off periods were investigated for the plasma characteristics of the glow and the afterglow modes.