Step and repeat fabrication of large-area nanostructures on COC plastic substrates using thermal nanoimprint Lithography

In this study, we proposed a method for thermal nanoimprint lithography on Cyclic Olefin Copolymer (COC) film substrate, and found the optimal experimental parameters such as imprinting pressure, holding time, and imprinting temperature. In addition, we focused on step and repeat thermal nanoimprint lithography (S&R T-NIL) on COC films to obtain large-area nanostructure patterns, by introducing a copper-based truncated square pyramid to achieve good resolution and then we conducted corresponding finite element analysis on the thermal field distribution of COC plastic substrates. The key operation of repeating nanoimprint is to find the optimal gap between each cycle, which can not only ensure the integrity of the pre-imprinted pattern, but also help improve production efficiency. Finally, this original method is used to deeply research step and repeat thermal nanoimprint lithography.