Comparison of Al2O3 and HfO2 MOSCAP III-V/Si Power Splitters and (De-) Interleavers for DWDM Optical Links

We compare III-V/Si MZIs and (de-)interleavers using Al
2
O
3
- and Hf0
2
-based MOSCAP structures as phase tuners. Hf0
2
twice as thick as Al
2
O
3
exhibited lower
$\mathrm{V}_{\pi}\mathrm{L}$
. We demonstrate crosstalk improvement of ring-assisted (de-)interleavers with both structures.