Methods for Measuring the Electrophysical Parameters of Semiconductor Wafers of VLSI

The article presents a fundamentally new software package TM-Studio, designed to measure electrical parameters when testing VLSI. The complex receives all the data for testing from the electronic accompanying sheets of the product. As a result, most of the shortcomings of the traditional approach to automation of the measurement process are eliminated. The concept of a measuring function was introduced and implemented in software, which made it possible to reduce the entire process of measuring electrophysical parameters to several standardized procedures that are easily adaptable to changing measurement conditions. The proposed complex allows you to change the measurement parameters in real time, which improves the quality of the traceability of objects of labor and reduces the overall complexity of the stage of measuring electrophysical parameters. The article compares the testing time of the same batch of wafers by two systems: (1) the well-known graphical measurement automation environment Keysight Technologies and (2) the TM-Studio complex developed according to the proposed method. The results of the comparison showed that the use of the proposed complex allows several times to speed up the process of manufacturing semiconductor wafers.