Planar Pattern Manipulation Surfaces Using Dual-Polarized Pin-Loaded Patch Resonating Elements

This article proposes a novel design concept to realize planar pattern manipulation surfaces (PPMSs) using dual-polarized pin-loaded patch resonating elements. First, the resonant frequency and reflection coefficient of the pin-loaded patch element are investigated through its equivalent circuit model. By changing the positions of shorting pins, the reflection phase of such a patch element can be appropriately adjusted while maintaining the reflection magnitude unchanged. Additionally, varying the positions of shorting pins possesses a significant property of polarization independence. Then, the dual-polarized pin-loaded patch element is employed to design the proposed PPMS. In this way, the incident wave is manipulated for different reflection angles with the dual-polarization response by adjusting the position distributions of shorting pins in two orthogonal polarization directions. To prove our presented design concept, two prototypes with reflection angles of (
$\theta ^{r} = 45^{\circ }$
,
$\phi ^{r} = 0^{\circ }$
) and (
$\theta ^{r} = 45^{\circ }$
,
$\phi ^{r} = 45^{\circ }$
) are finally implemented, fabricated, and measured. Measurements and calculations agree well with each other, which indicates that the reflection angle is experimentally obtained as predicted in theory. Thus, the proposed PPMS can be apparently viewed as a promising candidate to efficiently customize the radio environment in future wireless networks.