The Influence of O2, N2 or Air Ambient Gases on PAM Chemical Composition Produced by Argon RF Plasma Jet

Present study investigates the effect of gas environment on the chemical composition of plasma activated media (PAM). PAM was produced by argon RF plasma jet (13.56 MHz) at constant plasma power (10 W) in contact mode and in controlled atmosphere of air, O
2
or N2. The long-lifetime chemical species (H
2
O
2
, O
3
,
$\text{NO}_{2^{-}}$
and
$\text{NO}_{3^{-}}$
) monitored in the PAM by using UV absorption spectroscopy method [1] after plasma treatment. The duration of treatment was varied (0–30 min).