A Design-Oriented Approach to Implement Inverse Lithography Technology OPC in Silicon Photonics MPW Platform

OPC can increase the manufacturability of silicon photonics devices. Inverse lithography technology OPC can be applied to silicon photonics designs and demonstrate good devices performance. However, it's impractical to adopt inverse lithography technology OPC to layouts of large size. A design-oriented ILT OPC approach is proposed to increase the manufacturability of silicon photonics layouts and keep the overall runtime within an acceptable range.