Nanoscale Vacuum Field Emission Triode With a Double Gate Structure

A planar lateral Vacuum Field Emission Triode (VFET) with a double gate structure is proposed to improve the gate modulation characteristics in this letter. The preparation of this double gate structure is obtained by using the mature bottom gate VFET manufacturing process without any additional dedicated masks. The emission characteristics of the fabricated VFET under vacuum and atmosphere condition are measured. The experimental results demonstrate that both the bottom gate and the top gate can effectively control the emission electrons in the vacuum channel with width of about 110–200 nm which is successfully prepared by the electro-forming process. The operating mechanism of the device is basically the same as that of the plane-bottom gate VFET, and the device has achieved good field electron emission characteristics and double-gate modulation characteristics. Meanwhile, the vacuum channel is covered by the top gate insulator layer, which relaxing the vacuum requirement and improving the collection efficiency of emitted electrons by drain electrode about 50% in air.