Analysis of Dislocation Density and Pair Distribution Function for Annealed and ECR Plasma Etched Copper Foils

Copper foils are annealed and plasma etched in an indigenously developed 2.45GHz operated Electron Cyclotron Plasma (ECR) Plasma Enhanced Chemical Vapour Deposition (PECVD) reactor. This experiment is carried out to study and analyze the crystalline behaviour of copper foils. Based on the X-ray diffraction (XRD) data, dislocation density and Pair Distribution Function (PDF) analysis are carried out. PDF analysis technique yields the information on local density in the crystal structure surrounding a typical atom. This study is useful to analyze the recrystallization characteristics in copper foils observed after annealing and plasma etching in ECR plasma.