Microfluidic Flow Rate Sensor Using Electron Cloud Plasma Transport Within Silicon Microring Circuits

A microfluidic circuit with unique characteristics is proposed for microfluidic flow rate sensor. The microfluidic circuit consists of two silicon microrings having the shape of the PANDA ring with an embedded silver thin film at the center microring. The operation of the microfluidic circuit is based on the space-time function. The space-time function results from the input light of
$1.50~\mu \text{m}$
wavelength that multiplexes with the time function at the add port of the microfluidic circuit. The resonance condition with optimized parameters results in the observation of the whispering gallery mode at the center microrings. The input light excites the embedded silver thin film where the electron cloud results in forming the electron density. The oscillation of the electron cloud forms the electron cloud plasma where the plasma force is driven by the space-time control. The plasma force increases as the input power increases. The sensitivities of 0.07N(Kg-mW)
⁻¹
, 0.03N(Kg-mW)
⁻¹
and 0.13N(Kg-mW)
⁻¹
are obtained. The electron cloud plasma transport within the microfluidic circuit is driven by the input light (applied electric field) and pressure difference. The flow rate of the electron cloud plasma is obtained where the flow rate increases as the pressure difference increases. The sensitivities of
$0.04\times 10^{16}$
Electrons (Pa-s)
⁻¹
,
$0.03\times 10^{16}$
Electrons(Pa-s)
⁻¹
and
$0.02\times 10^{16}$
Electrons(Pa-s)
⁻¹
are obtained. In application, the microfluidic circuit can be applied for microfluidic quantum sensors.