Low Temperature ALD Films on Transparent And Flexible Substrates

ZnO nano films were grown by low-temperature atomic layer deposition on flexible and transparent substrates. The temperature deposition range of the films was from 80 to 120°C. The ZnO films were characterized via Spectroscopic Ellipsometry, X-ray diffraction and Room Temperature Photoluminescence. Decrease of the Optical Band Gap with increasing deposition temperature and crystallite size was observed.