The Annealing Effect on the Structure and Microstructure of Three-Dimensional Printed Zinc Oxide Films

In this work, ZnO films were obtained on glass by printing inks containing nanocrystals synthesized by the polyol method. ZnO films were annealed at (200–400) °C for 60 min in air and vacuum. The structural and microstructural properties of the deposited layers were investigated by X-ray diffraction. It allowed to study the effect of the temperature of post-growth annealing and the environment on the lattice parameters, the size of the coherent scattering (CSR) regions, and the level of microdeformations in the oxide samples. Annealing conditions were determined to provide ZnO films with properties suitable for use in electronic microdevices.