Replacement of Waveguides by a Resonant Cavity in a Microwave CVD Reactor

There are several configurations of a microwave chemical vapor deposition (MWCVD) reactor. The common characteristic of this reactor is the presence of waveguides. We describe a method that replaces the waveguide, responsible for conducting electromagnetic waves, with a resonant cavity (RC) coupled to a low-pressure chamber. Using RCs over waveguides can help produce dense plasma, which can be used in dissociation processes as the reagents are forced to move within a cavity until they reach the reaction chamber. Based on the excellent performance of the system, it was possible to deposit silicon oxide (SiO
₂
), with the aid of the argon gas mixture, oxygen, and tetraethylorthosilicate (TEOS), on a silicon substrate at room temperature. The film formed was analyzed using an interferometer and FTIR, concluding on the satisfactory quality of the film.