Dynamical Modeling of a Large Range Compliant Stage Considering the Intermediate Stage Effect

This paper presents an improved dynamical modeling method for the double parallelogram mechanism (DPM) based motion stage with a large workspace, where the impacts of intermediate stages are considered. According to the mode shape analysis of the DPM by the Euler-Bernoulli beam theory, it is observed that the high order modes induced by the intermediate stages have significant impacts on the dynamical behavior of the DPM. With this in consideration, the matrix displacement method is applied to the modeling of the DPM based compliant stage, where the intermediate stages of DPMs are regarded as nodes with masses. Correspondingly, an improved dynamical model is proposed to better describe the complicated dynamical characteristics of the compliant stage, which is further verified by finite element analysis (FEA) and experiments on a prototype. Compared with existing methods, the proposed dynamical model offers a new look into the kinetostatic analysis and dynamical design of the compliant mechanism-type micro/nanostage.