Fabricación de PICs basados en SiN utilizando litografía por escritura directa con láser UV [Not available in English]

In this work, we present preliminary results obtained in the fabrication of photonic integrated circuits (PICs) based on silicon nitride platform. We use direct writing lithography with UV laser to define structures with sub-micrometric resolutions, demonstrating the feasibility of manufacturing PICs in the clean room facilities at Centro Atómico Constituyentes (CNEA). With this technology, we can develop PICs prototypes for a big variety of applications rapidly and at a low cost.