Broadband Polarization Beam Splitters Based on MMI Couplers with Internal Photonic Crystals Fabricated Using 193 nm Photolithography

We demonstrate a silicon photonic MMI-coupler-based polarization beam splitter, fabricated using 193 nm photolithography. Measured extinction ratios beyond 30 dB and insertion losses below 3 dB are achieved over a record bandwidth of 111 nm.