On DRAM Rowhammer and the Physics of Insecurity

The dynamic random access memory (DRAM) disturb known as rowhammer (RH) has come to dominate the insecurity of computing systems worldwide. Several studies have concentrated on electron injection from a switching cell select transistor and capture by nearby storage node junctions as being the main mechanism for the effect. This article for the first time looks in-depth at RH from the point of view of both electron injection and capture, and capacitive crosstalk. The absence of such comprehensive studies at the silicon level in the literature can be attributed to its sensitive nature within the industry and highlights the difficulty of DRAM scaling. This review article, therefore, forms a broad foundation to extend understanding of this dangerous disturb mechanism and in so doing provides an informed view on the ability of future DRAM technologies to solve RH once and for all.