Indium beam implantation

Indium ion beam is generated in various ways and examined for implantation in a medium current ion implanter. The properties of both solid and gaseous source materials are tested to meet the needs for production use in ion implanter. The evaluation includes metal and energy contamination on wafer and the lifetime of an ion source and etc. We have found the methods of an indium implantation in our medium current machine inclusive of common ion dopants.