Abstract:
Monte Carlo simulation of GaAs nanowires MBE pulse growth was carried out. The arsenic flux pulse durations and the pauses between pulses were analyzed for optimizing gro...Show MoreMetadata
Abstract:
Monte Carlo simulation of GaAs nanowires MBE pulse growth was carried out. The arsenic flux pulse durations and the pauses between pulses were analyzed for optimizing growth conditions. To increase the axial wire growth rate at the initial stage the regime of additional arsenic flux modulation was considered. Growth in a high arsenic flux was proposed to start and stepwise reduce it during the growth process. This approach made it possible to increase the lifetime of a seed droplet at the nanowire top at a high crystal growth rate at the initial stage of growth.
Published in: 2020 21st International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)
Date of Conference: 29 June 2020 - 03 July 2020
Date Added to IEEE Xplore: 31 July 2020
ISBN Information: