Debris free sub-/spl mu/m structuring of arylazophosphonate containing polymers by XeCl excimer laser ablation

Summary form only given. Poly(arylazophosphonate)s are photolabile polymers with sufficient absorption at 308 nm to be patterned by XeCl laser ablation. Photoinduced fragmentation is accompanied by generation of molecular nitrogen supporting the ablation process. Practically no debris is found on the ablation site or on the surrounding area. Irradiating the polymer films through a phase mask in a proximity configuration, large area relief gratings with a period in the sub-/spl mu/m range are formed.