Ion-beam focusing in a double-plasma device

The authors studied the propagation of a low-energy charge-neutralized ion beam injected into the target region of a long double-plasma device. A magnetic field of up to approximately 180 G may be applied along the axis of the device. As a result of charge exchange collisions, the ion beam is attenuated as it propagates into the target region. However, under certain conditions of magnetic field strength and neutral gas pressure, the authors have observed a 'reemergence' of the beam on axis far downstream in the target. This reemergence of the ion beam is attributed to a focusing of the ions by a self-consistently produced radial ambipolar electric field. The effect may be expected to occur in other types of plasma devices as well, whenever a sufficiently large radially inward electric field is present.<
>