A Robust Tracking of a Compliant Nanomanipulator-based Micro Stereo Lithography System

Micro Stereo Lithography (MSL) has emerged as a promising and challenging technology in micro-/nano-scale additive manufacturing. Besides the requirement of the light source, the motion system requires ultra high precision tracking capability to reach the right location for every solidification event. To achieve 1-2 μm line width of the fabrication, we, in this paper, propose a robust control strategy to support a compliant nanomanipulator based MSL system. In particular, the nonlinearity and parameter-variation of the compliant manipulator are dealt with a robust RBF neural network, and the repetitive pattern is achieved by a repetitive control. Various simulations and real-time experiments are conducted to validate the proposed robust tracking control strategy, and the fabrication results demonstrate the developed MSL system is capable of fabricating a workpiece with a line width of 2.5 μm.