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Gate Stability and Robustness of In-Situ Oxide GaN Interlayer Based Vertical Trench MOSFETs (OG-FETs) | IEEE Conference Publication | IEEE Xplore

Gate Stability and Robustness of In-Situ Oxide GaN Interlayer Based Vertical Trench MOSFETs (OG-FETs)


Abstract:

Vertical GaN devices are currently studied for application in next-generation power converters, but very little is known about their reliability. This work presents the f...Show More

Abstract:

Vertical GaN devices are currently studied for application in next-generation power converters, but very little is known about their reliability. This work presents the first analysis on the stability of In-Situ Oxide GaN Interlayer based Vertical Trench MOSFET (OG-FET) submitted to forward gate bias. Based on pulsed measurements, step stress tests and threshold voltage transients we demonstrate the following original results: (i) under forward gate bias, the devices show a good stability up to 6-7 V; (ii) higher stress voltages induce a positive shift of threshold voltage (VTH), which has a logarithmic time-dependence and is ascribed to the injection of electrons in the oxide. (iii) The trapping mechanisms are recoverable; the related kinetics were investigated by means of threshold voltage transients at different temperatures.
Date of Conference: 31 March 2019 - 04 April 2019
Date Added to IEEE Xplore: 23 May 2019
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Conference Location: Monterey, CA, USA

References

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