Abstract:
We report all-Si metasurface based polarizing bandpass filter (PBF) fabricated on 12 inch wafer, employing CMOS-compatible 193nm ArF DUV immersion lithography and ICP etc...Show MoreMetadata
Abstract:
We report all-Si metasurface based polarizing bandpass filter (PBF) fabricated on 12 inch wafer, employing CMOS-compatible 193nm ArF DUV immersion lithography and ICP etch. The fabricated metasurface PBF work on dual short wave infrared bands.
Date of Conference: 03-07 March 2019
Date Added to IEEE Xplore: 25 April 2019
ISBN Information:
Conference Location: San Diego, CA, USA
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