Abstract:
Vertically-curved Si waveguide fabricated using 45nm-node ArF-immersion lithography and ion implantation bending method showed <;2.5dB minimum coupling loss, >130nm/0.5dB...Show MoreMetadata
Abstract:
Vertically-curved Si waveguide fabricated using 45nm-node ArF-immersion lithography and ion implantation bending method showed <;2.5dB minimum coupling loss, >130nm/0.5dB spectrum bandwidth for 5μm-MFD fiber coupling in both TE- and TM-polarization with very small polarization dependence.
Date of Conference: 03-07 March 2019
Date Added to IEEE Xplore: 25 April 2019
ISBN Information:
Conference Location: San Diego, CA, USA