High resolution electro-optic measurements of 2-D field distributions inside MMIC devices

Summary form only given. Frequency-domain electro-optic probing of potential and electric field distributions in MMICs have successfully been used for a function and failure test as well as for a quantitative circuit-internal characterization. To demonstrate the capabilities of the measurement technique especially for a device-internal analysis, in this paper the 2D electro-optic field mapping is applied to study coplanar MMIC components with structure sizes in the /spl mu/m and sub-/spl mu/m range. The experimental setup used consists of a combined direct electrooptic measurement system and a confocal laser-scan microscope.