Automated nanolithography process control for rapid & well ordered molecular self-assembly

Block copolymers (BCPs) are a promising candidate as a bottom up next generation lithography technique. To produce an industry ready BCP process several challenges must be met. We report on the pattern formation via phase segregation of spin coated diblock copolymers in the limit of high solvent vapor annealing. A block copolymer annealing chamber has been developed to rapidly and reliably produce wafer scale nano patterns without the need to heat solvents. The BCP reconstruction step can be performed insitu and film swelling is monitored in real time via reflectometry for end-point detection. The system is currently being developed for full automation.