Electromagnetic Pattern Extraction and Grouping for Near-Field Scanning of Integrated Circuits by PCA and K-Means Approaches

Electromagnetic patterns in near field scanning usually give important information about the source inside an device under test. In this paper, we develop a postprocessing technique, including standard-deviation-based method, principal component analysis, and K-means method, so that the electromagnetic patterns in near field scanning can be extracted fast and grouped automatically and efficiently. The postprocessing techniques are applied to experimental near-field scanning of ICs, such as a microcontroller unit (MCU) and a field programmable gate array (FPGA). The grouping on the electromagnetic patterns of the MCU is in good agreement with the published grouping result, and the grouping on the electromagnetic patterns of the FPGA can find out the additional cluster responsible for additional circuit.