Improvement of the Electrical Property of Silicon Nanoparticle Films Prepared via Hot Press Treatment

To reduce the thickness of crystalline silicon solar cells, solar cell structures were fabricated using silicon nanoparticles (SiNPs). High resistivity of the SiNP film was achieved without any treatment because voids were located in the film. A hot press treatment was performed to increase the density of the film. After the hot press treatment at 100 °C under pressure of 30 MPa, the thickness of the SiNP film decreased from 627 to 409 nm. The resistivity successfully decreased to 0.50 MΩ/sq because its necking was improved via the hot press treatment..