Table-Top Ion Implanter Based on Low-Voltage Vacuum Spark

The results of investigations of a low-voltage (<;2 kV) vacuum spark with a current rise time of about 0.5 μs are presented. The samples of LiF and KCI crystals were irradiated with a plasma discharge stream using Cu and Ag cathodes. The characteristics of photoluminescence of irradiated samples were performed with a sensitive scanning confocal fluorescence microscope. The photoluminescence of a layer less than 1 micron thick is recorded which consists of subnanosize clusters of cathode material formed from implanted ions. The x-ray fluorescence spectrometry method was used to measure the surface density of the ion beam emitted by a discharge that was 4 ×10
¹²
ion/cm
²
per pulse.